A Transport and Reaction Model for Simulating Cluster Secondary Ion Mass Spectrometry Depth Profiles of Organic Solids

被引:6
|
作者
Tuccitto, Nunzio [1 ]
Zappala, Gabriella
Vitale, Stefania
Torrisi, Alberto
Licciardello, Antonino
机构
[1] Univ Catania, Dept Chem Sci, Viale A Doria 6, I-95125 Catania, Italy
来源
JOURNAL OF PHYSICAL CHEMISTRY C | 2016年 / 120卷 / 17期
关键词
DIFFUSION-APPROXIMATION; ATOMIC REDISTRIBUTION; MOLECULAR-DYNAMICS; CROSS-LINKING; BOMBARDMENT; C-60; FILMS;
D O I
10.1021/acs.jpcc.6b01532
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The continuum equation is used for modeling erosion rate, ion beam induced mixing, and reactions during the sputtering process involved in secondary ion mass spectrometry experiments. We developed a new approach that is able to incorporate the beam induced reactivity, so leading to a reasonable simulation of depth profiles of polymers and organic solids. The model allows one to include the effects of the reactive gas dosing on sputtering yield and damage accumulation during profiling. Comparison with experimental data confirms the quality of the model and strengthens the proposed approach.
引用
收藏
页码:9263 / 9269
页数:7
相关论文
共 50 条
  • [31] Secondary ion mass spectrometry using cluster primary ion beams
    Gillen, G
    Fahey, A
    APPLIED SURFACE SCIENCE, 2003, 203 : 209 - 213
  • [32] Effects of Cryogenic Sample Analysis on Molecular Depth Profiles with TOF-Secondary Ion Mass Spectrometry
    Piwowar, Alan M.
    Fletcher, John S.
    Kordys, Jeanette
    Lockyer, Nicholas P.
    Winograd, Nicholas
    Vickerman, John C.
    ANALYTICAL CHEMISTRY, 2010, 82 (19) : 8291 - 8299
  • [33] Signal processing of secondary ion mass spectrometry profiles. New algorithm for enhancement of depth resolution
    Dahraoui, Nadia
    Boulakroune, M’Hamed
    Benatia, Djamel
    International Journal of Signal Processing, Image Processing and Pattern Recognition, 2015, 8 (08) : 199 - 210
  • [34] Precise and fast secondary ion mass spectrometry depth profiling of polymer materials with large Ar cluster ion beams
    Ninomiya, Satoshi
    Ichiki, Kazuya
    Yamada, Hideaki
    Nakata, Yoshihiko
    Seki, Toshio
    Aoki, Takaaki
    Matsuo, Jiro
    RAPID COMMUNICATIONS IN MASS SPECTROMETRY, 2009, 23 (11) : 1601 - 1606
  • [35] DEPTH PROFILE MEASUREMENT BY SECONDARY ION MASS-SPECTROMETRY
    MOENS, M
    VANCRAEN, M
    ADAMS, FC
    ANALYTICA CHIMICA ACTA, 1984, 161 (JUL) : 53 - 64
  • [36] The matrix effect in organic secondary ion mass spectrometry
    Shard, Alexander G.
    Spencer, Steve J.
    Smith, Steve A.
    Havelund, Rasmus
    Gilmore, Ian S.
    INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 2015, 377 : 599 - 609
  • [37] Secondary ion mass spectrometry of organic thin films using metal-cluster-complex ion source
    Fujiwara, Yukio
    Kondou, Kouji
    Nonaka, Hidehiko
    Saito, Naoaki
    Itoh, Hiroshi
    Fujimoto, Toshiyuki
    Kurokawa, Akira
    Ichimura, Shingo
    Tomita, Mitsuhiro
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 2006, 45 (33-36): : L987 - L990
  • [38] QUANTITATIVE ORGANIC SECONDARY ION MASS-SPECTROMETRY
    TODD, PJ
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1989, 197 : 39 - ANYL
  • [39] Secondary ion mass spectrometry of organic thin films using metal-cluster-complex ion source
    Fujiwara, Yukio
    Kondou, Kouji
    Nonaka, Hidehiko
    Saito, Naoaki
    Itoh, Hiroshi
    Fujimoto, Toshiyuki
    Kurokawa, Akira
    Ichimura, Shingo
    Tomita, Mitsuhiro
    Japanese Journal of Applied Physics, Part 2: Letters, 2006, 45 (33-36):
  • [40] Dynamic Reactive Ionization with Cluster Secondary Ion Mass Spectrometry
    Tian, Hua
    Wucher, Andreas
    Winograd, Nicholas
    JOURNAL OF THE AMERICAN SOCIETY FOR MASS SPECTROMETRY, 2016, 27 (02) : 285 - 292