Energetic process modelling of thin-layer electrocrystallization

A novel method for improving the energy performance of surface thin layer depositions by pulse currents is presented. We introduce the periodic pulse reverse current supplying an electroplating reactor and then develop a mathematical model of electrocrystallization processes. Next, the energy delivered to the reactor has been determined taking into account particular chemical processes governing the electrocrystallization. The improvement of cycling performance is reached by appropriate matching the period of supplying current to parameters of electroplating reactor.