Fabrication of buffer layer for YBCO coated conductor on cube textured Ag substrate

被引:3
|
作者
Yuasa, T
Kurosaki, H
Kim, S
Maeda, T
Higashiyama, K
Hirabayashi, I
机构
[1] ISTEC, Superconduct Res Lab, Atsuta Ku, Nagoya, Aichi 4568587, Japan
[2] Hitachi Ltd, Hitachi Res Lab, Hitachi, Ibaraki 3191221, Japan
来源
关键词
metal organic chemical vapor deposition; Ag tape; CeO2 buffer layer; surface roughness; pulsed laser deposition;
D O I
10.1016/S0921-4534(01)00446-4
中图分类号
O59 [应用物理学];
学科分类号
摘要
In case of the cube textured (CUTE) Ag substrate, recrystallization process of as-rolled Ag substrate in various atmosphere changed surface flatness of the substrate. When the substrate was heated in a vacuum chamber with a oxygen partial pressure of less than 1 x 10(-5) Torr at 600 degreesC, the surface average roughness (R-a) of the substrate was less than 120 nm. Then the oxygen was introduced into the vacuum chamber to fabricate CeO2 buffer layer on the substrate by pulsed laser deposition. After the oxygen pressure reached to 50-150 mTorr, CeO2 layer was deposited on the CUTE Ag substrate immediately. By reducing the influence of oxygen to surface roughness of the substrate, R-a of the CeO2 buffered CUTE Ag substrate was 30 nm. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:934 / 937
页数:4
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