An empirical study on the relationship between input of R&D and patent in China

被引：0

作者：

Ge, ZQ ^{[1
]}

Zhang, B ^{[1
]}

Jin, T ^{[1
]}

机构：

[1] Univ Elect Sci & Technol China, Sch Management, Chengdu 610054, Peoples R China

来源：

ORIENT ACADEMIC FORUM SPECIAL | 2004年

关键词：

GDP; Input of R&D; patent application; patent authorization; regression;

D O I：

暂无

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

This paper empirically researches the relationship between Input of R&D and Patent in China. The results show that the national outputs has positive effect on R&D inputs, but the degree of such effects are different among different industries. Further, we investigate the outcomes of Chinese R&D inputs. The results show that R&D inputs enhance patent application and patent authorization, and the positive relationship exists between the quantity of patent application and authorizations and R&D inputs. Finally some policy implications are given based on the empirical results.

引用

页码：112 / 117

页数：6

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