Carbon Film in RF Surface Plasma Source with Cesiation

被引：1
|
作者：
Dudnikov, Vadim [1 ]
Han, B. [2 ]
Murray, S. [2 ]
Pennisi, T. [2 ]
Stinson, C. [2 ]
Stockli, M. [2 ]
Welton, R. [2 ]
Dudnikov, A. [3 ]
机构：
[1] Muons Inc, 552 N Batavia Ave, Batavia, IL 60510 USA
[2] ORNL, Oak Ridge, TN 37830 USA
[3] BINP, Novosibirsk 630090, Russia
来源：
PROCEEDINGS OF THE 17TH INTERNATIONAL CONFERENCE ON ION SOURCES | 2018年 / 2011卷
关键词：
D O I：
10.1063/1.5053303
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Deposition of carbon film in RF SPS is observed. It is assumed that persistent cesiation without continuous cesium injection in the Spallation Neutron Source RF Surface Plasma Source (SPS) is related to deposition of carbon film on the collar converter. The work function dependence for graphite with alkali deposition has no minimum typical for metals and semiconductors and the final work function is higher. For this reason, the probability of H- secondary emission from cesiated metal and semiconductors can be higher than from cesiated carbon films but the carbon film maintains cesiation longer and can operate with low cesium consumption.
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页数：3
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