Microstructure and electric properties of (104)/(014)-oriented Bi3.15Nd0.85Ti3O12 films on Pt (III)/Ti/SiO2/Si by sol-gel method

被引:4
|
作者
Chen, X. Q. [1 ]
Qiao, Y.
Liu, X. L.
Lu, C. J.
Le Rhun, Gwenael
Senz, Stephan
Hesse, Dietrich
机构
[1] Hubei Univ, Dept Phys, Wuhan 430062, Hubei, Peoples R China
[2] Jianghan Univ, Dept Phys, Wuhan 430056, Hubei, Peoples R China
[3] Max Planck Inst Microstruct Phys, D-06120 Halle, Germany
基金
中国国家自然科学基金;
关键词
ferroelectrics; thin film; orientation; piezoelectricity;
D O I
10.1016/j.matlet.2007.03.106
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
B3.15Nd0.85Ti3O12 (BNdT) thin films with predominant (104)/(014) orientation were fabricated directly on (I I I)Pt/Ti/SiO2/Si substrates through a sol-gel process. The volume fraction of (104)/(014)-oriented grains in the film was estimated to be about 65% according to X-ray pole figure. The BNdT film is dense and uniform and consists of columnar grains penetrating the whole film thickness. The (104)/(014)-oriented BNdT film capacitors showed excellent ferroelectric properties with 2P(r)=46.4 mu C/cm(2) and E-c approximate to 140 kV/m. The films also exhibit excellent piezoelectric property, with high piezoelectric coefficient d(33) approximate to 17 pm/V. (c) 2007 Published by Elsevier B.V
引用
下载
收藏
页码:4897 / 4900
页数:4
相关论文
共 50 条
  • [1] Microstructure and ferroelectric properties of sol-gel derived Bi3.15Nd0.85Ti3O12 thin films on Pt/Ti/SiO2/Si(100)
    Li, JH
    Qiao, Y
    Liu, XL
    Nie, CJ
    Lu, CJ
    Xu, ZX
    Wang, SM
    Zhang, NX
    Xie, D
    Yu, HC
    Li, JQ
    APPLIED PHYSICS LETTERS, 2004, 85 (15) : 3193 - 3195
  • [2] Microstructure and electrical properties of ferroelectric Bi3.15Nd0.85Ti3O12/BiFeO3/Bi3.15Nd0.85Ti3O12 trilayered thin films on Pt/Ti/SiO2/Si
    Qi, Hongyan
    Wang, Huaixin
    Xu, Xiaojun
    Tang, Yu
    Xiao, Pengcheng
    Xiao, Ming
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2017, 28 (18) : 13757 - 13762
  • [3] Microstructure and electrical properties of ferroelectric Bi3.15Nd0.85Ti3O12/BiFeO3/Bi3.15Nd0.85Ti3O12 trilayered thin films on Pt/Ti/SiO2/Si
    Hongyan Qi
    Huaixin Wang
    Xiaojun Xu
    Yu Tang
    Pengcheng Xiao
    Ming Xiao
    Journal of Materials Science: Materials in Electronics, 2017, 28 : 13757 - 13762
  • [4] Improved ferroelectric and leakage properties in sol-gel derived BiFeO3/Bi3.15Nd0.85Ti3O12 bi-layers deposited on Pt/Ti/SiO2/Si
    Qi, Yajun
    Lu, Chaojing
    Zhang, Qiaofeng
    Wang, Lihua
    Chen, Fang
    Cheng, Chunsheng
    Liu, Baoting
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2008, 41 (06)
  • [5] Anisotropic ferro- and piezoelectric properties of sol-gel-grown Bi3.15Nd0.85Ti3O12 films with two different orientations on Pt/Ti/SiO2/Si
    Lu, C. J.
    Liu, X. L.
    Chen, X. Q.
    Nie, C. J.
    Le Rhun, Gwenael
    Senz, Stephan
    Hesse, Dietrich
    APPLIED PHYSICS LETTERS, 2006, 89 (06)
  • [6] Effects of film thickness on microstructure and ferroelectric properties of Bi3.15Nd0.85Ti3O12 thin films prepared by sol-gel method
    Liu, Changyong
    Guo, Dongyun
    Wang, Chuanbin
    Shen, Qiang
    Zhang, Lianmeng
    ADVANCED MATERIALS, PTS 1-4, 2011, 239-242 : 1275 - 1278
  • [7] Multiferroic properties of Bi3.15Nd0.85Ti3O12–NiFe2O4–Bi3.15Nd0.85Ti3O12 trilayer composite thin films prepared by a sol–gel process
    Feng Yang
    Fuwei Zhang
    Cuifang Dong
    Fen Liu
    Minghua Tang
    Journal of Sol-Gel Science and Technology, 2015, 73 : 469 - 475
  • [8] Dielectric enhancement of the trilayered Bi3.15Eu0.85Ti3O12/Bi3.15Nd0.85Ti3O12/Bi3.15Eu0.85Ti3O12 thin film deposited on Pt/Ti/SiO2/Si substrate
    J. F. Peng
    X. J. Zheng
    Z. H. Dai
    Journal of Materials Science: Materials in Electronics, 2014, 25 : 414 - 418
  • [9] Ferroelectric properties of epitaxial Bi3.15Nd0.85Ti3O12 films on SiO2/Si using biaxially oriented MgO as templates
    Meng, Q. Q.
    Zhao, R.
    Li, W. W.
    Yang, J.
    Wang, H.
    Stan, L.
    Yang, H.
    THIN SOLID FILMS, 2011, 519 (22) : 8023 - 8026
  • [10] Dielectric enhancement of the trilayered Bi3.15Eu0.85Ti3O12/Bi3.15Nd0.85Ti3O12/Bi3.15Eu0.85Ti3O12 thin film deposited on Pt/Ti/SiO2/Si substrate
    Peng, J. F.
    Zheng, X. J.
    Dai, Z. H.
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2014, 25 (01) : 414 - 418