Performance of tantalum as plasma electrode material in negative hydrogen ion sources

被引：1
|
作者：
Bacal, M. [1 ]
Maeshiro, K. [2 ]
Masaki, S. [3 ]
Wada, M. [2 ]
机构：
[1] Univ Paris 06, Ecole Polytech, Paris, France
[2] Doshisha Univ, Grad Sch Sci & Engn, Kyoto 6100394, Japan
[3] Grad Univ Adv Studies, Dept Fus Sci, Hayama, Kanagawa, Japan
来源：
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2021年 / 30卷 / 07期
关键词：
negative hydrogen ion; plasma electrode; tantalum; DISSOCIATIVE ATTACHMENT; VIBRATIONAL-EXCITATION; TUNGSTEN; DESORPTION; ABSORPTION; KINETICS;
D O I：
10.1088/1361-6595/abfbc8
中图分类号：
O35 [流体力学]; O53 [等离子体物理学];
学科分类号：
070204 ; 080103 ; 080704 ;
摘要：
The negative hydrogen ion current and the electron current extracted from arc discharge negative ion sources exhibit different characteristics when the discharge filament material or the plasma electrode material is changed. The knowledge of these characteristics is of importance for the proper design of an efficient H- ion source. We investigated the effect due to tungsten (W) and tantalum (Ta) adsorption on a stainless-steel plasma electrode and compared the results with the performance of the plasma electrodes covered by Ta and Ti foils. The result showed that freshly deposited Ta enhanced the H- ion current and reduced the co-extracted electron current in the same way as a caesium adsorbed film.
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收藏
页数：6
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