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Facile fabrication of flexible graphene FETs by sunlight reduction of graphene oxide
被引:5
|作者:
Ma, Jia-Nan
[1
]
He, Yan
[1
]
Liu, Yan
[2
]
Han, Dong-Dong
[1
]
Liu, Yu-Qing
[1
]
Mao, Jiang-Wei
[1
]
Jiang, Hao-Bo
[2
]
Zhang, Yong-Lai
[1
]
机构:
[1] Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, 2699 Qianjin St, Changchun 130012, Jilin, Peoples R China
[2] Jilin Univ, Key Lab Bion Engn, Minist Educ, Changchun 130022, Jilin, Peoples R China
基金:
中国国家自然科学基金;
关键词:
FIELD-EFFECT TRANSISTORS;
QUANTUM DOTS;
DEVICES;
FILMS;
D O I:
10.1364/OL.42.003403
中图分类号:
O43 [光学];
学科分类号:
070207 ;
0803 ;
摘要:
We reported here a facile fabrication of flexible graphene-based field effect transistors (FETs) by sunlight reduction of graphene oxide (GO) as channel material. As a mask-free and chemical-free method, sunlight photoreduction of GO without the use of any complex equipments is simple and green. The resultant FET demonstrated excellent electrical properties (e.g., an optimized I on/I off ratio of 111, hole mobility of 0.17 cm(2) V-1 s(-1)), revealing great potential for development of flexible microelectrics. Additionally, since the reduced GO channel could be fabricated by sunlight treatment between two pre-patterned electrodes, the process features post-fabrication capability, which makes it possible to integrate graphene-based devices with given device structures. (C) 2017 Optical Society of America
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页码:3403 / 3406
页数:4
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