Analysis of critical doping level of sprayed antimony doped tin oxide films

被引:22
|
作者
Ravichandran, K. [1 ]
Philominathan, P. [1 ]
机构
[1] AVVM Sri Pushpam Coll, PG & Res Dept Phys, Poondi 613503, Tamil Nadu, India
关键词
SNO2; THIN-FILMS; OPTICAL-PROPERTIES; PERFUME ATOMIZER; PYROLYSIS; DEPOSITION; FLUORINE; GROWTH; SNCL2;
D O I
10.1007/s10854-010-0106-y
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Antimony doped tin oxide films are fabricated using a simplified and inexpensive spray pyrolysis technique. The variation in the sheet resistance, as a function of Sb/Sn ratio in the spraying solution, is studied. The sheet resistance decreases with the increase in doping level, attains a minimum at a particular doping level and increases with further doping. This critical value of the doping ratio (Sb/Sn(critical)), at which the transition takes place, is found to be 2.5 at.%, when the concentration of the precursor solution is 0.8 M and 4.5 at.% when the concentration is 0.4 M. The reason for this variation is analyzed with the support of the Sb/Sn(critical) values, obtained by various researchers. This Sb/Sn(critical) is found to depend mainly on the carrier concentration of the films.
引用
收藏
页码:158 / 161
页数:4
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