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- [42] A new hydrogen chloride plasma-based copper etching process Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (12): : 7345 - 7352
- [43] A new hydrogen chloride plasma-based copper etching process JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (12): : 7345 - 7352
- [44] Analytical model for the uncorrelated emittance evolution of externally injected beams in plasma-based accelerators NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2018, 909 : 414 - 418
- [45] Towards the petascale in electromagnetic modeling of plasma-based accelerators for high-energy physics SCIDAC 2006: SCIENTIFIC DISCOVERY THROUGH ADVANCED COMPUTING, 2006, 46 : 215 - 219
- [46] A novel Rb vapor plasma source for plasma wakefield accelerators NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2014, 740 : 197 - 202