DFT calculations of NH3 adsorption and dissociation on gallium-rich GaAs(001)-4 x 2 surface

被引:7
|
作者
Lu, Hong-Liang [1 ]
Chen, Wei [1 ]
Ding, Shi-Jin [1 ]
Zhang, David Wei [1 ]
Wang, Li-Kang [1 ]
机构
[1] Fudan Univ, State Key Lab ASIC & Syst, Dept Microelect, Shanghai 200433, Peoples R China
关键词
D O I
10.1016/j.cplett.2007.08.008
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
NH3 adsorption and dissociation on gallium-rich GaAs(0 0 1)-4 x 2 surface have been investigated using hybrid density functional theory. NH3 is found to adsorb molecularly onto GaAs(0 0 1)-4 x 2 via formation of a dative bond with an adsorption energy of 21.1 kcaV mol. Two different dissociation paths, one hydrogen atom detached from NH3 transfer to the second-layer arsenic atom and insertion into the Ga-Ga dimer bond are subsequently discussed. Optimized geometries and potential energy surfaces along both reaction paths are presented. The calculation results show both reactions are thermodynamically favorable, although not kinetically favored. (C) 2007 Published by Elsevier B.V.
引用
收藏
页码:188 / 192
页数:5
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