Long-range order in thin epitaxial Fe3Si films grown on GaAs(001) -: art. no. 075329

被引:51
|
作者
Jenichen, B [1 ]
Kaganer, VM [1 ]
Herfort, J [1 ]
Satapathy, DK [1 ]
Schönherr, HP [1 ]
Braun, W [1 ]
Ploog, KH [1 ]
机构
[1] Paul Drude Inst Festkorperelekt, D-10117 Berlin, Germany
关键词
D O I
10.1103/PhysRevB.72.075329
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
As-grown thin epitaxial Fe3Si films fabricated by molecular beam epitaxy on GaAs(001) are studied by grazing incidence x-ray diffraction. The long-range order parameters of the films of different stoichiometry are determined by measuring fundamental and superlattice crystal truncation rods and comparing them to simulations in dynamical approximation. Two order parameters, associated with the degree of migration of Si atoms into different Fe sublattices, are obtained. A residual intermixing of the sublattices is found, even near complete stoichiometry. The relative positions of the Fe3Si and GaAs lattices are determined. Fe atoms in Fe3Si are located at the positions of the Ga atoms in GaAs, with an additional shift of 0.1 +/- 0.04 A of the tetragonally distorted Fe3Si lattice normal to the interface.
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页数:5
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