Technologies for Forming Electrodynamic Structures for Millimeter-Wave and Terahertz Vacuum Microelectronic Devices

被引：4

作者：

Starodubov, A. V. ^{[1
,2
]}

Nozhkin, D. A. ^{[1
]}

Rasulov, I. I. ^{[1
]}

Serdobintsev, A. A. ^{[1
]}

Kozhevnikov, I. O. ^{[1
]}

Galushka, V. V. ^{[1
,2
]}

Sakharov, V. K. ^{[2
]}

Bessonov, D. A. ^{[3
]}

Galkin, A. D. ^{[4
]}

Bakhteev, I. Sh. ^{[5
]}

Molchanov, S. Yu. ^{[5
]}

German, S. V. ^{[6
,7
]}

Ryskin, N. M. ^{[1
,2
]}

机构：

[1] Chernyshevsky Saratov State Univ, Saratov 410012, Russia

[2] Russian Acad Sci, Kotelnikov Inst Radioengn & Elect, Saratov Branch, Saratov 410038, Russia

[3] Gagarin Saratov State Tech Univ, Saratov 410054, Russia

[4] Ctr Laser, St Petersburg 195067, Russia

[5] Russian Acad Sci, Inst Solid State Phys, Chernogolovka 142432, Moscow oblast, Russia

[6] Russian Acad Sci, Skolkovskiy Inst Spect, Moscow 108840, Russia

[7] Inst Sci & Technol, Moscow 121205, Russia

来源：

JOURNAL OF COMMUNICATIONS TECHNOLOGY AND ELECTRONICS | 2022年 / 67卷 / 10期

基金：

俄罗斯科学基金会; 俄罗斯基础研究基金会;

关键词：

MEANDER-LINE; W-BAND; HIGH-POWER; TUBE; MICROFABRICATION; FABRICATION; CIRCUITS; DESIGN; GHZ;

D O I：

10.1134/S1064226922100126

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The electrodynamic microstructure technologies for production of millimeter and submillimeter-wave vacuum microelectronic devices are reviewed, including photolithography, deep reactive ion etching, computer numerical control micro- and nanomilling, electro-erosive micromachining, and additive technologies: 3D printing, selective laser sintering, and selective laser melting. An original approach to manufacture of planar slow-wave systems based on magnetron sputtering and laser ablation is discussed. Technological tolerances and surface roughness that can be obtained using the considered technologies are compared.

引用

页码：1189 / 1197

页数：9

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