Applications of photoemission electron microscopy (PEEM) in magnetism research

被引：16
|
作者：
Scholl, A [1 ]
机构：
[1] Ernest Orlando Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
来源：
CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE | 2003年 / 7卷 / 01期
关键词：
D O I：
10.1016/S1359-0286(03)00003-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
This paper reviews the application of X-ray photoemission electron microscopy (X-PEEM) to problems in modern magnetism. In particular. the ability to determine the magnetic domain structure of anti ferromagnetic thin films will be discussed. Published by Elsevier Science Ltd.
引用
收藏
页码：59 / 66
页数：8
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