An expanding thermal plasma for deposition of surface textured ZnO:Al with focus on thin film solar cell applications

被引：56

作者：

Groenen, R

Linden, JL

van Lierop, HRM

Schram, DC

Kuypers, AD

van de Sanden, MCM

机构：

[1] Eindhoven Univ Technol, Dept Phys, NL-5600 MB Eindhoven, Netherlands

[2] TNO, TPD, Div Mat Res & Technol, NL-5600 AN Eindhoven, Netherlands

来源：

APPLIED SURFACE SCIENCE | 2001年 / 173卷 / 1-2期

关键词：

zinc oxide; expanding thermal plasma; surface texture; transparent conducting oxide; solar cells;

D O I：

10.1016/S0169-4332(00)00875-8

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A new method for low temperature deposition of surface textured ZnO:Al is presented utilizing an expanding thermal plasma created by a cascaded are. Films are deposited at 200 degreesC at the rate of 0.65-0.75 nm s(-1) exhibiting low resistivity (<10(-3) <Omega> cm), high visible transmittance (>80%) and a rough surface texture. First application in p-i-n a-Si:H solar cells indicates promising light trapping properties. (C) 2001 Elsevier Science B.V. All rights reserved.

引用

页码：40 / 43

页数：4

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