X-ray radiation of the plasma focus with inverse pinch switch

被引：4
|
作者：
Choi, WS [1 ]
Park, DK
机构：
[1] Kimcheon Coll, Dept Ophthalm Opt, Kimchon 740200, Kyungsangbuk, South Korea
[2] Kyungpook Natl Univ, Dept Phys, Coll Educ, Taegu 702701, South Korea
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 2A期
关键词：
X-ray; plasma focus; m = 0 instability; inverse pinch switch; electron beam;
D O I：
10.1143/JJAP.38.913
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
X-ray radiation characteristics of the plasma focus with inverse pinch switch was investigated. The plasma focus device power with capability of 20 kJ contains a 40 kV condenser power supply and adopts a new type of switch system, The mechanism of X-ray radiation was analyzed using a pair of detectors. The variation of X-ray radiation as a function of the position of emitted X-ray and the shape of electrode was examined closely using the time-integrated method. By analyzing the mechanism, we found that the X-ray radiation has three peaks in the optimal plasma focus condition with the middle one being m = 0 instability.
引用
收藏
页码：913 / 917
页数：5
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