He+ scattering on clean and oxygen covered Al(111)

被引:6
|
作者
Kravchuk, T
Esaulov, VA
Hoffman, A
Monreal, RC
机构
[1] Univ Paris 11, CNRS, UMR 8625, Collis Atom & Mol Lab, F-91405 Orsay, France
[2] Technion Israel Inst Technol, Dept Chem, IL-32000 Haifa, Israel
[3] Univ Autonoma Madrid, Dept Fis Teor Mat Condensada CV, E-28049 Madrid, Spain
关键词
electron transfer; Auger neutralisation; Al(111); ion scattering; helium; oxygen adsorption;
D O I
10.1016/j.nimb.2005.03.020
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
We present results of a study of He+ neutralisation on clean and oxygen covered Al(1 1 1). For clean Al(1 1 1) we find a small ion fraction which rapidly increases with increasing ion energy attaining about (0.4 +/- 0.1)% at 4 keV. The overall behaviour is quite different from that observed on previously studied Ag surfaces and is attributed to reionisation processes, a conclusion supported by measurements using He atoms. When O-2 is adsorbed onto Al(1 1 1) at room temperature, we observe a rapid increase in the ion fraction, which attains a broad plateau for exposures higher than about 50 L. Experiments with incident He atoms lead to an ion fraction that is smaller, indicating that in this case a substantial fraction of ions is due to survival of incident ions. We attribute these changes to a decrease of the Auger neutralisation rates on the oxidic surface. (c) 2005 Published by Elsevier B.V.
引用
收藏
页码:27 / 31
页数:5
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