Resistive Switching Characteristics of Solution-Processed Transparent TiOx for Nonvolatile Memory Application

被引:35
|
作者
Jung, Seungjae [1 ]
Kong, Jaemin [1 ]
Song, Sunghoon [1 ]
Lee, Kwanghee [1 ,2 ,3 ]
Lee, Takhee [1 ,3 ]
Hwang, Hyunsang [1 ,3 ]
Jeon, Sanghun [4 ]
机构
[1] Gwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea
[2] Gwangju Inst Sci & Technol, Heeger Ctr Adv Mat, Kwangju 500712, South Korea
[3] Gwangju Inst Sci & Technol, Dept Nanobio Mat & Elect, Kwangju 500712, South Korea
[4] Samsung Adv Inst Technol, Devices Lab, Yongin 446712, Gyeonggi, South Korea
关键词
TITANIUM-OXIDE; DEVICES; FILMS;
D O I
10.1149/1.3489370
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
We propose a solution-processed transparent TiOx-based resistive switching random access memory (ReRAM) device. Electronically active TiOx was prepared by sol-gel spin coating of a titanium(IV) isopropoxide precursor on an indium tin oxide-coated glass. The prepared TiOx film is completely transparent in the visible range and has an amorphous structure. The fabricated TiOx-based ReRAM device exhibits distinct resistive switching under consecutive dc voltage sweeps of +/- 2 V. The device also exhibits good memory performance, including fast switching speed with a pulse width of 1 mu s, stable pulse endurance over 1000 cycles, and excellent retention characteristics at up to 125 degrees C. In addition, based on the log I - log V plot and X-ray photoelectron spectroscopy analysis, we postulate that the fabricated device is operated by the reversible formation/rupture of the conducting filament in the oxygen-deficient TiOx layer. (C) 2010 The Electrochemical Society. [DOI: 10.1149/1.3489370] All rights reserved.
引用
收藏
页码:H1042 / H1045
页数:4
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