Raman spectroscopy of epitaxial topological insulator Bi2Te3 thin films on GaN substrates

被引:26
|
作者
Xu, Hao [1 ,2 ]
Song, Yuxin [1 ]
Gong, Qian [1 ]
Pan, Wenwu [1 ,2 ]
Wu, Xiaoyan [1 ,2 ]
Wang, Shumin [1 ,3 ]
机构
[1] Chinese Acad Sci, State Key Lab Funct Mat Informat, Shanghai Inst Microsyst & Informat, Shanghai 200050, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Chalmers Univ Technol, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
来源
MODERN PHYSICS LETTERS B | 2015年 / 29卷 / 15期
关键词
Topological insulator; Bi2Te3; Raman spectroscopy; resonant Raman scattering; domain boundaries; electron-phonon interaction; BISMUTH TELLURIDE; PHONONS; GROWTH; SCATTERING; NANORODS; BI2SE3;
D O I
10.1142/S021798491550075X
中图分类号
O59 [应用物理学];
学科分类号
摘要
Bi2Te3 has drawn great attention in recent years as both a topological insulator and the best thermoelectric material at room temperature. We report on Raman spectroscopic study on Bi2Te3 thin films with thicknesses of 20-50 nm grown on GaN by molecular beam epitaxy. All the four classical optical phonon modes are clearly revealed for the first time in ex situ Raman for epitaxial Bi2Te3. Unusual and infrared-active vibration modes are also observed and analyzed. In the resonant Raman measurements, abnormal enhancement and suppression of different modes are studied. The interface modes caused by a large density of domain boundaries formed during coalescence of crystal islands with different lattice orientations and the Frohlich electron-phonon interaction are found to play significant roles during the Raman scattering processes.
引用
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页数:10
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