Spatial distribution of yellow luminescence related deep levels in GaN

被引:15
|
作者
Hsu, JWP [1 ]
Schrey, FF [1 ]
Ng, HM [1 ]
机构
[1] Bell Labs, Lucent Technol, Murray Hill, NJ 07974 USA
关键词
D O I
10.1063/1.1628398
中图分类号
O59 [应用物理学];
学科分类号
摘要
Using two-photon excitation, we study the excitation power density dependence and spatial variation of photoluminescence (PL) in GaN films grown by molecular beam epitaxy. Under our experimental conditions, the excitation power density dependence is quadratic for near band-gap emission (NBE) and linear for yellow luminescence (YL), consistent with the YL process being saturated. The PL mapping reveals NBE fluctuations at the domain-size scale while YL is uniform. These results provide strong evidence that the spatial distribution of deep levels associated with YL is uniform; hence, YL is unrelated to dislocations. (C) 2003 American Institute of Physics.
引用
收藏
页码:4172 / 4174
页数:3
相关论文
共 50 条
  • [41] Properties of the yellow luminescence in undoped GaN epitaxial layers
    Hofmann, DM
    Kovalev, D
    Steude, G
    Meyer, BK
    Hoffmann, A
    Eckey, L
    Heitz, R
    Detchprom, T
    Amano, H
    Akasaki, I
    PHYSICAL REVIEW B, 1995, 52 (23): : 16702 - 16706
  • [42] Optoelectronic properties of GaN epilayers in the region of yellow luminescence
    Grazzi, C.
    Strunk, H.P.
    Castaldini, A.
    Cavallini, A.
    Schenk, H.P.D.
    Gibart, P.
    Journal of Applied Physics, 2006, 100 (07):
  • [43] Correlating yellow and blue luminescence with carbon doping in GaN
    Schmult, S.
    Schuermann, H.
    Schmidt, G.
    Veit, P.
    Bertram, F.
    Christen, J.
    Grosser, A.
    Mikolajick, T.
    JOURNAL OF CRYSTAL GROWTH, 2022, 586
  • [44] Yellow luminescence and Fermi level pinning in GaN layers
    Shalish, I
    Kronik, L
    Segal, G
    Shapira, Y
    Eizenberg, M
    Salzman, J
    APPLIED PHYSICS LETTERS, 2000, 77 (07) : 987 - 989
  • [45] Evidence of compensating centers as origin of yellow luminescence in GaN
    Schubert, EF
    Goepfert, ID
    Redwing, JM
    APPLIED PHYSICS LETTERS, 1997, 71 (22) : 3224 - 3226
  • [46] Selective excitation and thermal quenching of the yellow luminescence of GaN
    Colton, JS
    Yu, PY
    Teo, KL
    Weber, ER
    Perlin, P
    Grzegory, I
    Uchida, K
    APPLIED PHYSICS LETTERS, 1999, 75 (21) : 3273 - 3275
  • [47] Effect of reactive ion etching on the yellow luminescence of GaN
    Basak, D
    Lachab, M
    Nakanishi, T
    Sakai, S
    APPLIED PHYSICS LETTERS, 1999, 75 (23) : 3710 - 3712
  • [48] Luminescence properties of strained GaN epilayers and spatial configurations of silicon impurity and related defects
    Gurskii, AL
    Lutsenko, EV
    Zelenkovskii, VM
    Bezjazychnaja, TV
    Pavlovskii, VN
    Zubialevich, VZ
    Schineller, B
    Schön, O
    Yablonskii, GP
    Heuken, M
    INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, PROCEEDINGS, 2002, : 425 - 429
  • [49] Characterization and discrimination of AlGaN- and GaN-related deep levels in AlGaN/GaN heterostructures
    Armstrong, Andrew
    Chakraborty, Arpan
    Speck, James S.
    DenBaars, Steven P.
    Mishra, Umesh K.
    Ringel, Steven A.
    PHYSICS OF SEMICONDUCTORS, PTS A AND B, 2007, 893 : 223 - +
  • [50] Spatial variation of luminescence in thick GaN films
    Bertram, F
    Srinivasan, S
    Ponce, FA
    Riemann, T
    Christen, J
    Molnar, RJ
    APPLIED PHYSICS LETTERS, 2001, 78 (09) : 1222 - 1224