Chemical ordering of FePt films using millisecond flash-lamp annealing

被引：1

作者：

Brombacher, C. ^{[1
]}

Schubert, C. ^{[1
]}

Daniel, M. ^{[1
]}

Liebig, A. ^{[1
]}

Beddies, G. ^{[1
]}

Schumann, T. ^{[2
]}

Skorupa, W. ^{[2
]}

Donges, J. ^{[3
]}

Haeberlein, S. ^{[4
]}

Albrecht, M. ^{[1
]}

机构：

[1] Tech Univ Chemnitz, Inst Phys, D-09107 Chemnitz, Germany

[2] Helmholtz Zentrum Dresden Rossendorf, Inst Ion Beam Phys & Mat Res, D-01328 Dresden, Germany

[3] Deutsch Elektronen Synchrotron DESY, D-22607 Hamburg, Germany

[4] FHR Anlagenbau GmbH, D-01458 Ottendorf Okrilla, Germany

来源：

JOURNAL OF APPLIED PHYSICS | 2012年 / 111卷 / 02期

关键词：

THIN-FILMS; MAGNETS; RANGE;

D O I：

10.1063/1.3677991

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The structural and magnetic properties of 20-nm-thick FexPt100-x films that were processed by 20 ms flash-lamp annealing were investigated. A maximum in coercivity of (10.4 +/- 0.5) kOe was achieved for a composition of Fe53Pt47, which shows also a high degree of L1(0) chemical order. A variation of the chemical composition toward either higher or lower Fe content leads to a lowering of the coercivity, which can be attributed to a reduction in L1(0) ordered volume fraction. Thus, in the millisecond time regime, the fastest ordering transformation occurs for slightly Fe-rich FePt films. (C) 2012 American Institute of Physics. [doi: 10.1063/1.3677991]

引用

页数：4

共 50 条

[21] ELECTRICAL ACTIVATION AND DAMAGE ANNEALING OF BORON-IMPLANTED SILICON BY FLASH-LAMP IRRADIATION
WIESER, E
PANKNIN, D
[J]. PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1984, 82 (01): : 171 - 177
[22] Soft X-ray absorption study of tantalum incorporation in titanium oxide films: Impact of flash-lamp annealing
Gago, R.
Prucnal, S.
Esteban-Mendoza, D.
[J]. CERAMICS INTERNATIONAL, 2020, 46 (10) : 15772 - 15778
[23] FLASH-LAMP ANNEALING OF LOCAL CENTERS IN THE TRANSITION REGION OF SI-SIO2
LYSENKO, VS
ZIMENKO, VI
TYAGULSKY, IP
OSIYUK, IN
SNITKO, OV
SYTENKO, TN
[J]. DOPOVIDI AKADEMII NAUK UKRAINSKOI RSR SERIYA A-FIZIKO-MATEMATICHNI TA TECHNICHNI NAUKI, 1985, (01): : 47 - 50
[24] Thermal annealing of FePt thin films by millisecond plasma arc pulses
Inaba, Yuki
Torres, Karen L.
Cole, Amanda
Vanfleet, Richard
Ott, Ronald
Klemmer, Tim
Harrell, J. W.
Thompson, Gregory B.
[J]. JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, 2009, 321 (16) : 2451 - 2458
[25] FLASH-LAMP PUMPED LASER USING EMERALD GROWN BY FLUX METHOD
GULEV, VS
ELISEEV, AP
SOLNTSEV, VP
KHRANENKO, GG
YURKIN, AM
[J]. KVANTOVAYA ELEKTRONIKA, 1987, 14 (10): : 1990 - 1992
[26] Temperature dependent chemical ordering in FePt(001) and FePt(110) films
Schwickert, MM
Hannibal, KA
Toney, MF
Best, M
Folks, L
Thiele, JU
Kellock, AJ
Weller, D
[J]. JOURNAL OF APPLIED PHYSICS, 2000, 87 (09) : 6956 - 6958
[27] FLASH-LAMP ANNEALING OF ION-IMPLANTED SILICON AND ITS APPLICATION TO SOLAR-CELLS
USAMI, A
YOSHIDA, N
INOUE, Y
[J]. IEEE ELECTRON DEVICE LETTERS, 1983, 4 (06) : 166 - 168
[28] Flash-Lamp Annealing for Manufacturing of Reduced Thermal Budget Self-Aligned LTPS TFTs
Packard, Glenn M.
Manley, Robert G.
Hirschman, Karl D.
[J]. 2019 TWENTY-SIXTH INTERNATIONAL WORKSHOP ON ACTIVE-MATRIX FLATPANEL DISPLAYS AND DEVICES (AM-FPD): TFT TECHNOLOGIES AND FPD MATERIALS, 2019,
[29] Fabrication of thin ferroelectric Hf0.5Zr0.5O2 films by millisecond flash lamp annealing
Tanimura, Hideaki
Ota, Yuto
Kawarazaki, Hikaru
Kato, Shinichi
Nara, Yasuo
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2023, 62 (SC)
[30] Low-thermal-budget crystallization of ferroelectric Al:HfO2 films by millisecond flash lamp annealing
Tanimura, Hideaki
Ueno, Yuma
Mifune, Tomoya
Fujisawa, Hironori
Nakashima, Seiji
Osaka, Ai I.
Kato, Shinichi
Mikawa, Takumi
[J]. JAPANESE JOURNAL OF APPLIED PHYSICS, 2024, 63 (09)

← 1 2 3 4 5 →