Threshold enhancement in two-photon photopolymerization

被引：5
|
作者：
Boiko, Y [1 ]
Bowen, MS [1 ]
Wang, M [1 ]
Costa, J [1 ]
Esener, S [1 ]
机构：
[1] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
来源：
COMPLEX MEDIUMS | 2000年 / 4097卷
关键词：
microfabrication; two-photon absorption; photopolymerization; threshold; cationic; free radical;
D O I：
10.1117/12.390598
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
It is demonstrated that threshold reduction of two-photon polymerization is achievable by means traditionally employed for sensitivity enhancement for single photon photoinitiation, such as heavy atom enhancement of intersystem crossing, electron donor agent, concentration increase of initiator. It is shown that measured threshold is in reverse proportion to square root of initiator concentration, whereas observed length of induction period exhibits reverse proportionality to the square of light intensity. Overall, experimentally observed threshold values of two-photon induced photopolymerization are effected by all intermediate stages of energy transformation in the photochemical sequences leading to photoinitiation, in particular, inter-system crossing of excited initiating molecules as well as by monomer reactivity.
引用
收藏
页码：254 / 263
页数：10
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