Interfacial interactions and their impact on redox-based resistive switching memories (ReRAMs)

被引:107
|
作者
Valov, Ilia [1 ]
机构
[1] Res Ctr Juelich, Elect Mat PGI 7, Wilhelm Johnen Str, D-52425 Julich, Germany
关键词
interfacial interactions; ReRAM; surfaces; ECM; VCM; memristive devices; nonvolatile memories; SOLID-ELECTROLYTE; ELECTROCHEMICAL SYSTEMS; THERMAL-STABILITY; THIN-FILMS; METAL; OXIDE; GROWTH; TRANSITION; CONDUCTION; BEHAVIOR;
D O I
10.1088/1361-6641/aa78cd
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Redox-based resistive switching memories are nowadays one of the most studied systems in both academia and industrial communities. These devices are scalable down to an almost atomic level and are supposed to be applicable not only for next-generation nonvolatile memories, but also for neuromorphic computing, alternative logic operations and selector devices. The main characteristic feature of these cells is their nano-to sub-nano dimension. This makes the control and especially prediction of their properties very challenging. One of the ways to achieve better understanding and to improve the control of these systems is to study and modify their interfaces. In this review, first the fundamentals will be discussed, as these are essential for understanding which factors control the nanoscale interface properties. Further, different types of interactions at the electrode/solid electrolyte interface reported for ECM-and VCM-type cells will be exemplarily shown. Finally, the strategies and different solutions used to modify the interfaces and overcome the existing problems on the way to more stable and reliable devices will be highlighted.
引用
收藏
页数:20
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