LARGE AREA MACROPOROUS SILICON LAYERS FOR MONOCRYSTALLINE THIN-FILM SOLAR CELLS

被引：6

作者：

Ernst, Marco ^{[1
]}

Brendel, Rolf ^{[1
]}

机构：

[1] Inst Solar Energy Res Hamelin ISFH, D-31860 Emmerthal, Germany

来源：

35TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE | 2010年

关键词：

N-TYPE SILICON; SI;

D O I：

10.1109/PVSC.2010.5614496

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

We produce uniform macroporous double-layers on 6 inch n-type silicon substrates by electrochemical etching under rear side illumination in a hydrofluoric acid (HF)-based electrolyte. The etched area is circular with a diameter of 13 cm. We demonstrate the detachment of 20 mu m thick free-standing macroporous silicon layers with an area of 8 x 8 cm(2).

引用

页码：3122 / 3124

页数：3

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