A novel profilometer for nanometric form assessment for large machined surfaces

被引:1
|
作者
Yang, H [1 ]
Kim, S
Walker, D
机构
[1] SATREC Initiat Co Ltd, Taejon 305811, South Korea
[2] Yonsei Univ, Dept Astron, Space Opt Lab, Seoul 120179, South Korea
[3] UCL, Dept Phys & Astron, Opt Sci Lab, London WC1E 6BT, England
来源
关键词
stylus profilometry; laser interferometry; surface form; large machined surface;
D O I
10.4028/www.scientific.net/KEM.257-258.225
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report a new point-by-point stylus profilometer for efficient form assessment for large and curved optical surfaces. The system consists of a laser reference system and a low contact force type stylus system. For laser datum referencing, the freely propagated laser beam is monitored by a nulling quadrant photodiode mounted on a flexure system with hybrid actuators, which also carries interferometer reference optics for vertical displacement measurement. The compensation accuracy of the reference system is within 10 nm for the external disturbance of 0.7 mu m. The stylus system adapts a hybrid type of plunger and pivot for the long travel length of approximately 30 mm and a low contact force of 70 mg. This probe system shows a repeatability of less than 10 nm for la for up to 8.1 degrees of slope. The performance of the reference and probe systems was measured. The results demonstrate its applicability for the form measurement of large and curved optical surfaces both ground and polished during the fabrication process.
引用
收藏
页码:225 / 230
页数:6
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