Crystallisation of TiO2 thin films induced by excimer laser irradiation

被引：24

作者：

Van Overschelde, O. ^{[1
]}

Snyders, R. ^{[2
]}

Wautelet, A. ^{[1
]}

机构：

[1] Univ Mons, B-7000 Mons, Belgium

[2] Rhein Westfal TH Aachen, D-52074 Aachen, Germany

来源：

APPLIED SURFACE SCIENCE | 2007年 / 254卷 / 04期

关键词：

excimer; anatase; TiO2; thin films;

D O I：

10.1016/j.apsusc.2007.08.018

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Titanium dioxide thin films have been deposited by reactive magnetron sputtering on glass substrate and subsequently irradiated by UV radiation using a KrF excimer laser. In this work, we have study the influence of the laser fluence (F) ranging between 0.05 and 0.40 mJ/cm(2) on the constitution and microstructure of the deposited films. Irradiated thin films are characterized by profilometry, scanning electron microscopy and X-ray diffraction. As deposited films are amorphous, while irradiated films present an anatase structure. The crystallinity of the films strongly varies as a function of F with maximum for F = 0. 125 J/cm(2). In addition to the modification of their constitution, the irradiated areas present a strongly modified microstructure with appearance of nanoscale features. The physico-chemical mechanisms of these structural modifications are discussed based on the theory of nucleation. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：971 / 974

页数：4

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