Ion beam patterning of diblock copolymer thin films

被引：0
|
作者：
Allen, Ranulfo [1 ]
Kim, Ho-Cheol [2 ]
Baglin, John [2 ]
Park, Oun-Ho [2 ]
Cheng, Joy Y. [3 ]
机构：
[1] Princeton Univ, Dept Chem Engn, Philadelphia, PA 19139 USA
[2] IBM Corp, Almaden Res Ctr, San Jose, CA 95120 USA
[3] MIT, Dept Mat Sci & Engn, Cambridge, MA 01239 USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2007年 / 233卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
103-POLY
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页数：1
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