Optimization of FIB milling for rapid NEMS prototyping

被引：3

作者：

Malm, Bjarke ^{[1
]}

Petersen, Dirch H. ^{[1
]}

Lei, Anders ^{[1
]}

Booth, Timothy J. ^{[1
]}

Homann, Lasse V. ^{[1
]}

Boggild, Peter ^{[1
]}

机构：

[1] Tech Univ Denmark, DTU Nanotech, Dept Micro & Nanotechnol, DK-2800 Lyngby, Denmark

来源：

MICROELECTRONIC ENGINEERING | 2011年 / 88卷 / 08期

关键词：

Focused Ion Beam; Prototyping; NEMS; Drift; Redeposition; FOCUSED ION-BEAM; PROBES;

D O I：

10.1016/j.mee.2010.11.049

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate an optimized milling technique to focused ion beam (FIB) milling in template silicon membranes for fast prototyping of nanoelectromechanical systems (NEMS). Using a single-pass milling strategy the highly topology dependent sputtering rate is boosted and shorter milling time is achieved. Drift independence is obtained for small critical features using a radial scan strategy, and a back scan routine ensures minimal line width deviation removing redeposited material. Milling a design similar to a nano four-point probe with a pitch down to 400 nm we display what optimized FIB milling in NEMS development can accomplish. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：2671 / 2674

页数：4

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