Transverse thermoelectric response in tilted orientation La1-xSrxCoO3 (0.05 ≤ x ≤ 0.4) thin films

被引:27
|
作者
Wang, Y. [1 ]
Yu, L. [1 ,2 ]
Jiang, B. [3 ]
Zhang, P. X. [1 ,2 ]
机构
[1] Kunming Univ Sci & Technol, Fac Mat Sci & Engn, Inst Adv Mat Photoelectrons, Kunming 650051, Peoples R China
[2] Max Planck Inst Solid State Res, D-70569 Stuttgart, Germany
[3] Xiangtan Univ, Minist Educ, Key Lab Low Dimens Mat & Applicat Technol, Xiangtan 411105, Peoples R China
关键词
LA0.95SR0.05COO3; ANISOTROPY; VOLTAGE;
D O I
10.1063/1.3673552
中图分类号
O59 [应用物理学];
学科分类号
摘要
La1-xSrxCoO3 (0.05 <= x <= 0.4) thin films with tilted c-axis have been grown on vicinal cut LaAlO3 (100) substrates by pulse laser deposition. The single phase and the epitaxial growth of these thin films have been checked by x-ray diffraction analysis. Transverse thermoelectric voltage response in these films has been studied at room temperature by using a pulse laser as the thermal source. The maximum voltage response has been observed in La0.7Sr0.3CoO3 films in this series of oxides, with the responsivity of 1.23V/mJ in 10 degrees tilted film. The resistivity and the thermal diffusivity have been reckoned as the main physical parameters to determine the time response of establishment and decay processes of transverse thermoelectric voltage, respectively. Smaller resistivity leads to fast response speed to establish the voltage, while larger thermal diffusivity results in the fast decay of voltage. (C) 2011 American Institute of Physics. [doi: 10.1063/1.3673552]
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页数:5
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