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Modeling of metal-ferroelectric-semiconductor field effect transistors
被引:9
|作者:
Macleod, TC
[1
]
Ho, FD
机构:
[1] NASA, George C Marshall Space Flight Ctr, Huntsville, AL 35812 USA
[2] Univ Alabama, Dept Elect & Comp Engn, Huntsville, AL 35899 USA
关键词:
ferroelectric transistors;
hysteresis modeling;
ferroelectric time decay;
D O I:
10.1080/10584589808202057
中图分类号:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号:
0808 ;
0809 ;
摘要:
The characteristics for a MFS FET (metal-ferroelectric-semiconductor field effect transistor) is very different than a conventional MOSFET and must be modeled differently. The drain current has a hysteresis shape with respect to the gate voltage. The position along the hysteresis curve is dependent on the last positive or negative polling of the ferroelectric material, The drain current also has a logarithmic decay after the last polling. A model has been developed to describe the MFSFET drain current for both gate voltage on and gate voltage off conditions. This model takes into account the hysteresis nature of the MFSFET and the time dependent decay. The model is based on the shape of the Fermi-Dirac function which has been modified to describe the MFSFET's drain current. This is different from the model proposed by Chen et. al.([1]) and that by Wu([2]).
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页码:127 / 143
页数:17
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