共 50 条
- [1] The accurate modeling of the temperature response of semiconductor production wafers during rapid thermal processing [J]. 13TH IEEE INTERNATIONAL CONFERENCE ON ADVANCED THERMAL PROCESSING OF SEMICONDUCTORS - RTP 2005, 2005, : 283 - 291
- [2] Rapid thermal processing of silicon wafers with emissivity patterns [J]. Journal of Electronic Materials, 2006, 35 : 877 - 891
- [7] Model-Based Temperature Control in Thermal Processing of Silicon Wafers [J]. IFAC PAPERSONLINE, 2022, 55 (26): : 180 - 186
- [8] Temperature measurement issues in rapid thermal processing [J]. RAPID THERMAL AND INTEGRATED PROCESSING VI, 1997, 470 : 3 - 15
- [10] MEASUREMENT OF TEMPERATURE PROFILES ACROSS SINGLE WAFERS IN RAPID THERMAL ANNEALERS [J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1987, 21 (2-4): : 618 - 621