Effect of Heat Treatment on the Structure of Titanium Dioxide Films

被引:8
|
作者
Komlev, A. E. [1 ]
Lapshin, A. E.
Magdysyuk, O. V.
Plotnikov, V. V.
Shapovalov, V. I.
Shutova, N. S.
机构
[1] St Petersburg State Electrotech Univ, St Petersburg 197376, Russia
基金
俄罗斯基础研究基金会;
关键词
THIN-FILMS; TIO2; FILM; MAGNETRON;
D O I
10.1134/S1063785010100202
中图分类号
O59 [应用物理学];
学科分类号
摘要
The development of nanocrystalline phases during isothermal annealing of titanium dioxide films deposited by reactive magnetron sputtering at various rates onto silica glass substrates has been studied. It is established that the heat treatment at temperatures within 500-700 degrees C in air or in vacuum leads to significantly different results, depending on the initial crystalline structure of as-deposited films.
引用
收藏
页码:942 / 944
页数:3
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