Resonant Raman scattering on self-assembled GaN quantum dots

被引:22
|
作者
Kuball, M
Gleize, J
Tanaka, S
Aoyagi, Y
机构
[1] Univ Bristol, HH Wills Phys Lab, Bristol BS8 1TL, Avon, England
[2] Univ Toulouse 3, Phys Solides Lab, F-31062 Toulouse, France
[3] Hokkaido Univ, Res Inst Elect Sci, Kita Ku, Sapporo, Hokkaido 0600812, Japan
[4] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan
关键词
D O I
10.1063/1.1347386
中图分类号
O59 [应用物理学];
学科分类号
摘要
Self-assembled GaN quantum dots grown on Al0.15Ga0.85N using Si as antisurfactant have been investigated by resonant Raman scattering. Phonons of GaN quantum dots of different sizes and the Al0.15Ga0.85N barrier layer were probed selectively by varying the laser excitation energy from 3.53 to 5.08 eV. Phonon confinement effects were studied on GaN quantum dots of 2-3 nm height. We show that although grown using Si (a common donor for GaN) as an antisurfactant, only a small electron concentration is present in the GaN quantum dots. Implications on the role of Si for the formation of the GaN quantum dots will be discussed. (C) 2001 American Institute of Physics.
引用
收藏
页码:987 / 989
页数:3
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