InSb1-xNx/InSb/GaAs alloys by thermal annealing for midinfrared photodetection

被引:10
|
作者
Lim, K. P. [1 ]
Pham, H. T. [1 ]
Yoon, S. F. [1 ]
Tan, K. H. [1 ]
Ngo, C. Y. [2 ]
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
[2] ASTAR, Inst Mat Res & Engn, Singapore 117602, Singapore
关键词
MOLECULAR-BEAM EPITAXY; INNXSB1-X ALLOYS; DILUTE INNXSB1-X; GROWTH; PHOTOLUMINESCENCE; GAINNAS;
D O I
10.1063/1.3524228
中图分类号
O59 [应用物理学];
学科分类号
摘要
InSb1-xNx alloys on GaAs substrates are prepared by molecular beam epitaxy and in situ thermal annealed at different temperatures in Sb ambience. X-ray diffraction indicates that the amount of N incorporation in Sb lattice sites is dependent on the annealing temperature. Low annealing temperature increases the N incorporation and extends the absorption to long wavelength infrared range. InSb1-xNx photoconductors operating near 10 mu m at 77 K are realized. The measured wavelengths are in good agreement with band gaps of the alloys calculated using a two-level band anticrossing model with Varshni relation. This work will benefit those working on midinfrared photodetectors. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3524228]
引用
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页数:3
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