The Damage Threshold of Multilayer Film Induced by Femtosecond and Picosecond Laser Pulses

被引:5
|
作者
Wang, Yunzhe [1 ,2 ]
Cheng, Xiangzheng [3 ]
Shao, Junfeng [1 ]
Zheng, Changbin [1 ]
Chen, Anmin [4 ]
Zhang, Luwei [1 ]
机构
[1] Chinese Acad Sci, Changchun Inst Opt Fine Mech & Phys, State Key Lab Laser Interact Matter, Changchun 130033, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Key Lab Electroopt Countermeasures Test & Evaluat, Luoyang 471003, Peoples R China
[4] Jilin Univ, Inst Atom & Mol Phys, Changchun 130012, Peoples R China
基金
中国国家自然科学基金;
关键词
laser-induced damage threshold; multilayer film; femtosecond laser; picosecond laser; TA2O5; THIN-FILMS; INDUCED BREAKDOWN; ELECTRIC-FIELD; NANOSECOND; COATINGS; SIO2;
D O I
10.3390/coatings12020251
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Laser-induced damage threshold (LIDT) is an essential factor in measuring the anti-laser damage of optical films. The damage threshold and morphology of the Ta2O5/SiO2 multilayer film prepared by electron beam evaporation were studied by femtosecond (50 fs) and picosecond (30 ps) laser irradiations. The results showed that the LIDT of the film was 1.7 J center dot cm(-2) under the femtosecond laser. The damage morphology developed from surface damage to a clear layered structure, and the outline has become more transparent and regular with an increase in the laser fluence. Under the picosecond laser irradiation, the LIDT of the film was 2.0 J center dot cm(-2). The damage morphology developed from small range to thin film layer separation, and the outline changed from blurry to clear with an increase in laser fluence. Therefore, the LIDT of the film decreased with a decrease in the laser pulse width.
引用
收藏
页数:8
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