ELECTRICAL AND PLASMA CHARACTERISTICS OF 150 kHz BAND HIGH-POWER BURST INDUCTIVELY COUPLED PLASMA

被引：0
|
作者：
Shibata, K. [1 ]
Konno, S. [1 ]
Takahashi, K. [1 ]
Mukaigawa, S. [1 ]
Takaki, K. [1 ]
Yukimura, K. [1 ]
机构：
[1] Iwate Univ, Ueda 4-3-5, Morioka, Iwate 0208551, Japan
来源：
2017 IEEE 21ST INTERNATIONAL CONFERENCE ON PULSED POWER (PPC) | 2017年
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D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Plasma source of an inductively coupled plasma (ICP) driven by high voltage burst pulse has been developed. A 200 mu s wide burst of 157 kHz power supply was used to produce plasma with repetition rate of 1 Hz. The electrical and plasma parameters are obtained based on mutual induction circuit model by analyzing waveforms of the coil current and the voltage. The plasma density was also obtained using a double probe measurement. The results showed that electrical power into plasma was obtained as 13.1 kW. The plasma density was obtained to be 10(19) m(-3) order by the equivalent circuit, which is good agreement with that obtained with probe measurement.
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页数：4
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