A novel atomic force microscopy based lithography system for automated patterning via anodic oxidation

被引:0
|
作者
Gan, Y. J. [1 ]
Wong, H. Y. [1 ]
Lee, W. P. [1 ]
机构
[1] Multimedia Univ, Fac Engn, Cyberjaya 63100, Selangor, Malaysia
关键词
Microstructures; Automation; Atomic force microscopy; SILICON; PROBE;
D O I
10.1016/j.compositesb.2010.12.007
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
An Atomic force microscopy (AFM) based lithography system is successfully designed and constructed for automated patterning through local anodic oxidation. We present the detailed design of this system, where a novel technique is introduced by utilizing a motorized high precision XY stages to provide precise pattern movements while the AFM tip remains stationery. Several in-house hardware such as source measure unit and microscope imaging camera are integrated and controlled by a software tool. Numerous oxide structures are successfully created to demonstrate the ability of this low cost and accurate system, including a 30 pm long cantilever. (c) 2010 Elsevier Ltd. All rights reserved.
引用
收藏
页码:456 / 461
页数:6
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