Character and fabrication of Al/Al2O3/Al tunnel junctions for qubit application

被引：15

作者：

Shen DanDan ^{[1
]}

Zhu Ran ^{[1
]}

Xu WeiWei ^{[1
]}

Chang JunJie ^{[1
]}

Ji ZhengMing ^{[1
]}

Sun GuoZhu ^{[1
]}

Cao ChunHai ^{[1
]}

Chen Jian ^{[1
]}

机构：

[1] Nanjing Univ, Res Inst Superconductor Elect, Nanjing 210093, Jiangsu, Peoples R China

来源：

CHINESE SCIENCE BULLETIN | 2012年 / 57卷 / 04期

关键词：

Al/Al2O3/Al junctions; electron beam evaporation; superconducting qubit; DYNAMICS;

D O I：

10.1007/s11434-011-4821-4

中图分类号：

O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];

学科分类号：

07 ; 0710 ; 09 ;

摘要：

The superconductive Josephson junction is the key device for superconducting quantum computation. We have fabricated Al/Al2O3/Al tunnel junctions using a double angle evaporation method based on a suspended shadow mask. The Al2O3 junction barrier has been formed by introducing pure oxygen into the chamber during the fabrication process. We have adjusted exposure conditions by changing either the oxygen pressure or the oxidizing time during the formation of tunnel barriers to control the critical current density J(c) and the junction specific resistance R-c. Measurements of the leakage in Al/Al2O3/Al tunnel junctions show that the devices are suitable for qubit applications.

引用

页码：409 / 412

页数：4

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