N incorporation into InGaAs cap layer in InAs self-assembled quantum dots

被引:3
|
作者
Chen, JF [1 ]
Hsiao, RS
Hsieh, PC
Chen, YJ
Chen, YP
Wang, JS
Chi, JY
机构
[1] Natl Chiao Tung Univ, Dept Electrophys, Hsinchu, Taiwan
[2] Chung Yuan Christian Univ, Dept Phys, Chungli, Taiwan
[3] Ind Technol Res Inst, Hsinchu, Taiwan
关键词
D O I
10.1063/1.2140891
中图分类号
O59 [应用物理学];
学科分类号
摘要
This study presents the results of incorporating N into self-assembled InAs quantum dots (QDs) capped with an InGaAs cap layer. Experimental results indicate that such incorporation can redshift the QD ground state and decrease the energy spacing between the QD ground and first excited states. However, this incorporation reduces the potential barrier of the cap layer, increasing the electron escape from the QDs. Capacitance-voltage profiling shows that a broad shoulder corresponding to the electron emission from the QD ground to first-excited state cannot be resolved from the peak related to the electron emission from the excited states upon this incorporation. This finding implies that this incorporation reduces the energy spacing between the QD ground and first-excited states in the conduction band, thus correlating well with the photoluminescence data. In contrast, incorporating N directly into the InAs QD produces no redshift of the emission wavelength but introduces a deep trap at similar to 0.21 eV that depletes the electrons in the QDs. (c) 2005 American Institute of Physics.
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页数:5
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