A facile synthesis of reduced holey graphene oxide for supercapacitors

被引：33

作者：

Hu, Xinjun ^{[1
,2
]}

Bai, Dongchen ^{[3
]}

Wu, Yiqi ^{[1
]}

Chen, Songbo ^{[1
]}

Ma, Yu ^{[1
]}

Lu, Yue ^{[1
]}

Chao, Yuanzhi ^{[1
]}

Bai, Yongxiao ^{[1
]}

机构：

[1] Lanzhou Univ, Key Lab Magnetism & Magnet Mat, Key Lab Special Funct Mat & Struct Design, Minist Educ,Inst Mat Sci & Engn, Lanzhou 730000, Gansu, Peoples R China

[2] Sichuan Univ Sci & Engn, Coll Mech Engn, Zigong 643000, Peoples R China

[3] 1 Middle Sch Lanzhou, Lanzhou 730000, Gansu, Peoples R China

来源：

CHEMICAL COMMUNICATIONS | 2017年 / 53卷 / 99期

关键词：

NANOMESH; FABRICATION;

D O I：

10.1039/c7cc07475a

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Hydroxyl radicals ((OH)-O-center dot) generated from a UV/O-3 solution reaction is used to efficiently etch graphene oxide nanosheets under moderate conditions. Reduced holey graphene oxide is directly used as a supercapacitor electrode material and exhibits high specific capacitance (224 F g(-1) at a current density of 1 A g(-1)) and high volumetric capacitance (up to 206 F cm(-3)).

引用

页码：13225 / 13228

页数：4

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