A facile synthesis of reduced holey graphene oxide for supercapacitors

被引：33
|
作者：
Hu, Xinjun [1 ,2 ]
Bai, Dongchen [3 ]
Wu, Yiqi [1 ]
Chen, Songbo [1 ]
Ma, Yu [1 ]
Lu, Yue [1 ]
Chao, Yuanzhi [1 ]
Bai, Yongxiao [1 ]
机构：
[1] Lanzhou Univ, Key Lab Magnetism & Magnet Mat, Key Lab Special Funct Mat & Struct Design, Minist Educ,Inst Mat Sci & Engn, Lanzhou 730000, Gansu, Peoples R China
[2] Sichuan Univ Sci & Engn, Coll Mech Engn, Zigong 643000, Peoples R China
[3] 1 Middle Sch Lanzhou, Lanzhou 730000, Gansu, Peoples R China
来源：
CHEMICAL COMMUNICATIONS | 2017年 / 53卷 / 99期
关键词：
NANOMESH; FABRICATION;
D O I：
10.1039/c7cc07475a
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Hydroxyl radicals ((OH)-O-center dot) generated from a UV/O-3 solution reaction is used to efficiently etch graphene oxide nanosheets under moderate conditions. Reduced holey graphene oxide is directly used as a supercapacitor electrode material and exhibits high specific capacitance (224 F g(-1) at a current density of 1 A g(-1)) and high volumetric capacitance (up to 206 F cm(-3)).
引用
收藏
页码：13225 / 13228
页数：4
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