Influence of Deposition Time on ZnS Thin Films Performance with Chemical Bath Deposition

被引：13

作者：

Zhou, Limei ^{[1
]}

Tang, Nan ^{[1
]}

Wu, Sumei ^{[1
]}

Hu, Xiaofei ^{[1
]}

Xue, Yuzhi ^{[1
]}

机构：

[1] Dalian Jiaotong Univ, Sch Mat Sci & Engn, Dalian 116028, Peoples R China

来源：

2011 INTERNATIONAL CONFERENCE ON PHYSICS SCIENCE AND TECHNOLOGY (ICPST) | 2011年 / 22卷

关键词：

Chemical bath deposition; ZnS; Thin films; Deposition time; Annealed;

D O I：

10.1016/j.phpro.2011.11.055

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

ZnS thin films had been deposited by chemical bath deposition method onto glass substrates in alkaline liquor. The reaction solution is made of ZnSO4, NH4OH and SC(NH2)(2). Different deposition times (1 h, 1.5 h, 2 h, 2.5 h and 3 h) were selected to study the performance of ZnS thin films. As the results, the ZnS films' thickness were about 50-207 nm. XRD results showed an amorphous structure. Through comparing the surface morphology before and after annealing, it could be seen that annealing made some particles grow up and the surface smooth and even. The transmittance decreased with the increase of deposition time in the range of 300-800 nm. The transmittance of annealed ZnS film was lower than that of deposited one in the range of 300-800 nm. The ZnS band gap values were calculated in the range of 3.72-3.9 eV. (C) 2011 Published by Elsevier B.V. Selection and/or peer-review under responsibility of Garry Lee.

引用

页码：354 / 359

页数：6

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