Quantification of the Electromechanical Measurements by Piezoresponse Force Microscopy

被引:27
|
作者
Buragohain, Pratyush [1 ]
Lu, Haidong [1 ]
Richter, Claudia [2 ]
Schenk, Tony [3 ]
Kariuki, Pamenas [2 ]
Glinsek, Sebastjan [4 ]
Funakubo, Hiroshi [5 ]
Iniguez, Jorge [4 ,6 ]
Defay, Emmanuel [4 ]
Schroeder, Uwe [2 ]
Gruverman, Alexei [1 ]
机构
[1] Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
[2] NaMLab gGmbH, Noethnitzer Str 64 A, D-01187 Dresden, Germany
[3] Ferroelect Memory GmbH, Charlotte Buhler Str 12, D-01099 Dresden, Germany
[4] Luxembourg Inst Sci & Technol, Mat Res & Technol Dept, 41 Rue Brill, L-4422 Belvaux, Luxembourg
[5] Tokyo Inst Technol, Sch Mat & Chem Technol, Yokohama, Kanagawa 2268502, Japan
[6] Univ Luxembourg, Dept Phys & Mat Sci, 41 Rue Brill, L-4422 Belvaux, Luxembourg
基金
美国国家科学基金会;
关键词
ferroelectric hafnium oxide; negative piezoelectric coefficient; piezoresponse force microscopy; PFM quantification; SWITCHING BEHAVIOR; NANOSCALE CONTROL; HAFNIUM OXIDE; POLARIZATION; ELECTRORESISTANCE; IMPRINT; DOMAINS; FILMS;
D O I
10.1002/adma.202206237
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Piezoresponse force microscopy (PFM) is widely used for characterization and exploration of the nanoscale properties of ferroelectrics. However, quantification of the PFM signal is challenging due to the convolution of various extrinsic and intrinsic contributions. Although quantification of the PFM amplitude signal has received considerable attention, quantification of the PFM phase signal has not been addressed. A properly calibrated PFM phase signal can provide valuable information on the sign of the local piezoelectric coefficient-an important and nontrivial issue for emerging ferroelectrics. In this work, two complementary methodologies to calibrate the PFM phase signal are discussed. The first approach is based on using a standard reference sample with well-known independently measured piezoelectric coefficients, while the second approach exploits the electrostatic sample-cantilever interactions to determine the parasitic phase offset. Application of these methodologies to studies of the piezoelectric behavior in ferroelectric HfO2-based thin-film capacitors reveals intriguing variations in the sign of the longitudinal piezoelectric coefficient, d(33,eff). It is shown that the piezoelectric properties of the HfO2-based capacitors are inherently sensitive to their thickness, electrodes, as well as deposition methods, and can exhibit wide variations including a d(33,eff) sign change within a single device.
引用
收藏
页数:11
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