Characterization of NiO thin films for gas sensor

被引：0

作者：

Hotovy, I ^{[1
]}

Capkovic, R ^{[1
]}

Huran, J ^{[1
]}

Siciliano, P ^{[1
]}

Rella, R ^{[1
]}

Spiess, L ^{[1
]}

机构：

[1] Slovak Univ Technol Bratislava, Dept Microelect, Bratislava 81219, Slovakia

来源：

SENSORS AND MICROSYSTEMS | 2000年

关键词：

D O I：

10.1142/9789812792013_0032

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Nickel oxide thin films were prepared by dc reactive magnetron sputtering from a nickel metal target in an Ar-O-2 mixed atmosphere in two sputtering modes. The oxygen content in the gas mixture varied from 15 to 45%. The films deposited in the metal-sputtering mode at high target voltage (320-326 V) resulted in a polycrystalline (fcc) NiO phase with nearly stoichiometric composition. On contrary, the films prepared in the oxide-sputtering mode at low target voltage (293-298 V) were amorphous and oxygen rich. All examined NiO films were semiconductors and their conductance increased by four orders of magnitude between 25 and 350 degrees C. Finally, NiO films were tested in order their response to CO and NH3 at various operating temperatures.

引用

页码：180 / 185

页数：6

共 50 条

[31] Preparation and Electrochromic Characterization of Nanocrystalline Nio-Base Thin Films
Wang, Lianchao
ADVANCED ENGINEERING MATERIALS, PTS 1-3, 2011, 194-196 : 2355 - 2364
[32] Deposition and microstructural characterization of NiO thin films by a spray pyrolysis method
Univ of Science and Technology of, China, Anhui, China
J Cryst Growth, 3-4 (656-659):
[33] Preparation and characterization of spray pyrolyzed nickel oxide (NiO) thin films
Patil, PS
Kadam, LD
APPLIED SURFACE SCIENCE, 2002, 199 (1-4) : 211 - 221
[34] SYNTHESIS AND CHARACTERIZATION OF PHYSICAL PROPERTIES OF THE NiO THIN FILMS BY VARIOUS CONCENTRATIONS
Maaoui, B.
Aoun, Y.
Benramache, S.
Nid, A.
Far, R.
Touati, A.
ADVANCES IN MATERIALS SCIENCE, 2020, 20 (03): : 79 - 87
[35] Preparation and Characterization of NiO Thin Films by DC Reactive Magnetron Sputtering
Reddy, Y. Ashok Kumar
Reddy, A. Mallikarjuna
Reddy, A. Sivasankar
Reddy, P. Sreedhara
JOURNAL OF NANO- AND ELECTRONIC PHYSICS, 2012, 4 (04)
[36] Deposition and microstructural characterization of NiO thin films by a spray pyrolysis method
Xie, Y
Wang, WZ
Qian, YT
Yang, L
Chen, ZW
JOURNAL OF CRYSTAL GROWTH, 1996, 167 (3-4) : 656 - 659
[37] Characterization by XAS of NiO thin films prepared by pulsed LASER deposition
Moscovici, J.
Bouessay, I.
Rougier, A.
Michalowicz, A.
PHYSICA SCRIPTA, 2005, T115 : 326 - 328
[38] Microstructure and activity of thin films for a microelectronic gas sensor
Patel, SV
Dibattista, M
Gland, JL
Schwank, JW
POLYCRYSTALLINE THIN FILMS: STRUCTURE, TEXTURE, PROPERTIES, AND APPLICATIONS II, 1996, 403 : 559 - 564
[39] Characteristics of a Pt/NiO thin film-based ammonia gas sensor
Chen, Huey-Ing
Hsiao, Cheng-Yu
Chen, Wei-Cheng
Chang, Ching-Hong
Chou, Tzu-Chieh
Liu, I-Ping
Lin, Kun-Wei
Liu, Wen-Chau
SENSORS AND ACTUATORS B-CHEMICAL, 2018, 256 : 962 - 967
[40] Thin Chal-AgI films as gas sensor
Petkova, T.
Popov, C.
Petkov, P.
Monchev, B.
Nedeva, Y.
JOURNAL OF OPTOELECTRONICS AND ADVANCED MATERIALS, 2007, 9 (10): : 3167 - 3170

← 1 2 3 4 5 →