Effect of a red-shifted benzotriazole UV absorber on curing depth and kinetics in visible light initiated photopolymer resins for 3D printing
被引:13
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作者:
Bail, Robert
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机构:
Dankook Univ, Ctr Photofunct Energy Mat CPEM, Dept Creat Convergent Mfg Engn CCME, Yongin 16890, South KoreaDankook Univ, Ctr Photofunct Energy Mat CPEM, Dept Creat Convergent Mfg Engn CCME, Yongin 16890, South Korea
Bail, Robert
[1
]
Hong, Ji Yoon
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机构:
Dankook Univ, Dept Polymer Sci & Engn, Yongin 16890, South KoreaDankook Univ, Ctr Photofunct Energy Mat CPEM, Dept Creat Convergent Mfg Engn CCME, Yongin 16890, South Korea
Hong, Ji Yoon
[2
]
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h-index:
机构:
Chin, Byung Doo
[2
]
机构:
[1] Dankook Univ, Ctr Photofunct Energy Mat CPEM, Dept Creat Convergent Mfg Engn CCME, Yongin 16890, South Korea
[2] Dankook Univ, Dept Polymer Sci & Engn, Yongin 16890, South Korea
Microstereolithography;
Photopolymerization;
Cure-depth control;
UV/vis absorber;
3D printing;
STEREOLITHOGRAPHY;
PHOTOINITIATOR;
D O I:
10.1016/j.jiec.2016.04.017
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
We have investigated the effects of a red-shifted UV absorber in projection-microstereolithography operating under blue visible light (405 nm). A 2-(2-hydroxyphenyl)-benzotriazole derivative (Tinuvin (R) CarboProtect (R) : CarboP) was introduced as an absorbing additive. A remarkable decrease of the curing depth from over 800 mu m in the pristine resin to 65 mu m at 0.2 mol% CarboP was observed, while the polymerization and build times were somewhat increased. Microfluidic channels were accurately fabricated with the modified resin whereas the pristine photopolymer did not form any precise patterns. This demonstrates potential applications of modified UV absorbers in visible light initiating resins for precise 3D printing. (C) 2016 Published by Elsevier B.V. on behalf of The Korean Society of Industrial and Engineering Chemistry.
机构:
Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine M, Shanghai 200050, Peoples R ChinaUniv Haute Alsace, CNRS, IS2M UMR7361, F-68100 Mulhouse, France
机构:
Chinese Acad Sci, Shanghai Inst Ceram, State Key Lab High Performance Ceram & Superfine M, Shanghai 200050, Peoples R ChinaUniv Haute Alsace, CNRS, IS2M UMR7361, F-68100 Mulhouse, France
Xiao, Pu
Dumur, Frederic
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机构:
Aix Marseille Univ, CNRS, ICR, UMR 7273, F-13397 Marseille, FranceUniv Haute Alsace, CNRS, IS2M UMR7361, F-68100 Mulhouse, France