Determination by x-ray reflectivity and small angle x-ray scattering of the porous properties of mesoporous silica thin films

被引：62

作者：

Dourdain, S

Bardeau, JF

Colas, M

Smarsly, B

Mehdi, A

Ocko, BM

Gibaud, A ^{[1
]}

机构：

[1] Univ Maine, Lab Phys Etat Condense, CNRS, UMR 6087, F-72085 Le Mans, France

[2] Max Planck Inst Colloids & Interfaces, D-14424 Potsdam, Germany

[3] Univ Montpellier 2, Lab Chim Mol & Organisat Solide, CNRS, UMR 5637, F-34095 Montpellier, France

[4] Brookhaven Natl Lab, Dept Phys, Upton, NY 11973 USA

来源：

APPLIED PHYSICS LETTERS | 2005年 / 86卷 / 11期

关键词：

D O I：

10.1063/1.1887821

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Two-dimensional hexagonal silica thin films templated by a triblock copolymer were investigated by grazing incident small angle x-ray scattering (GISAXS) and x-ray reflectivity (XR) before and after removing the surfactant from the silica matrix. XR curves-analyzed above and below the critical angle of the substrate-are evaluated by the matrix technique to obtain the average electron density of the films, the wall thickness, the electron density of the walls, the radius of the pores, and subsequently the porosity of such mesoporous films. In combination with GISAXS, the surface area of the mesopores is ascertained, thereby providing a complete analysis of the porosity in thin films by x-ray scattering methods. (C) 2005 American Institute of Physics.

引用

页码：1 / 3

页数：3

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