Extending Ion Source Life on High Current Ion Implant Tools with In-Situ Chemical Cleaning

被引：0
|
作者：
Uvais, A. [1 ]
Jinguji, M. [2 ]
Sato, Y. [2 ]
Yotsumoto, T. [2 ]
Botet, A. [1 ]
机构：
[1] ATMI, Danbury, CT 06810 USA
[2] Toshiba Co Ltd, Oita, Japan
来源：
ION IMPLANTATION TECHNOLOGY 2010 | 2010年 / 1321卷
关键词：
Implant; ion source life; in-situ cleaning; xenon difluoride;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Ion source replacement is generally the most frequent maintenance activity on an ion implanter impacting both productivity and consumable costs. In this paper we review the different mechanisms responsible for ion source failure. We report on in-situ chemical cleaning tests conducted at Toshiba Oita, which have shown potential for significant extension in source life. Several factors impact the effectiveness of xenon difluoride including failure modes, cleaning time and flow rates.
引用
收藏
页码：423 / +
页数：2
相关论文
共 50 条
  • [21] Development of high current negative ion source
    Kuroda, T
    FUSION ENGINEERING AND DESIGN, 1997, 36 (01) : 143 - 156
  • [22] High current microwave proton ion source
    Jain, SK
    Jain, A
    Hannurkar, PR
    INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 2001, 39 (1-2) : 45 - 49
  • [23] High current cluster ion beam source
    Seki, T
    Matsuo, J
    Takaoka, GH
    APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2003, 680 : 715 - 718
  • [24] HIGH CURRENT CONTINUOUS DUOPLASMATRON ION SOURCE
    ORMROD, JH
    BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1969, 14 (02): : 203 - &
  • [25] A decaborane ion source for high current implantation
    Perel, AS
    Loizides, WK
    Reynolds, WE
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2002, 73 (02): : 877 - 879
  • [26] Novel ion implantation method for extending source life with solid source of indium and antimony
    Nakasaka, T
    Torigoe, K
    Ichii, M
    Nakamura, T
    2003 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, CONFERENCE PROCEEDINGS, 2003, : 149 - 152
  • [27] HIGH-CURRENT ION-SOURCE
    BROWN, IG
    GAVIN, JE
    MACGILL, RA
    APPLIED PHYSICS LETTERS, 1985, 47 (04) : 358 - 360
  • [28] HIGH CURRENT AND GOOD EMITTANCE ION SOURCE
    NUNOGAKI, M
    ITOH, J
    AKIMUNE, H
    SUITA, T
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1971, 10 (11) : 1640 - &
  • [29] High-current ECR ion source
    Voronin, G
    Solnyshkov, D
    Svinin, M
    Solnyshkov, A
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2000, 161 : 1118 - 1122
  • [30] Long Term Study of the Effectiveness of In-Situ Chemical Source Clean with XeF2 on Ion Implanter
    Fuchs, Dieter
    Kerkel, Klaus
    Vogl, Josef
    Dorozynskyj, Michael
    ION IMPLANTATION TECHNOLOGY 2012, 2012, 1496 : 360 - 363
12345