Thermal properties of anisotropic diffusion of Si adsorbates on a Si(001) surface

被引:5
|
作者
Doi, T [1 ]
Ichikawa, M [1 ]
Hosoki, S [1 ]
Ninomiya, K [1 ]
机构
[1] JOINT RES CTR ATOM TECHNOL, TSUKUBA, IBARAKI 305, JAPAN
关键词
reflection electron microscopy (REM); semiconducting surfaces; silicon; surface diffusion; vicinal single crystal surfaces;
D O I
10.1016/0039-6028(96)00280-4
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The diffusion of Si adsorbates deposited on a Si(001) clean surface is investigated by using a reflection electron microscope (REM), When the sample is heated by radiative heating and/or direct current heating, the denuded zones are created at the terrace edge, The diffusion constants of the Si adsorbates are determined based on the denuded zone width. Isotropic diffusions are observed in the opposite directions both on the 2 x 1 terrace and on the I x 2 terrace, Diffusion constants have the same Value in both the step-up and the step-down directions, so D-u(2 x 1) = D-d(2 x 1) = D-2 x 1 and D-u(1 x 2) = D-d(1 x 2) = D-1 x 2, at least up to 800 degrees C, However, the diffusion constant D-1 x 2 perpendicular to the dimer is 5 to 6 times as large as the diffusion constant D-2 x 1 parallel to it, thus anisotropic diffusion is observed on a Si(001) surface.
引用
收藏
页码:868 / 872
页数:5
相关论文
共 50 条
  • [31] Ab initio modeling of a diffusion mode for a Si ad-dimer on the Si(001) surface
    Goringe, CM
    Bowler, DR
    PHYSICAL REVIEW B, 1997, 56 (12) : R7073 - R7075
  • [32] Structural and electronic properties of the Li/Si(001) surface
    Chung, JW
    SURFACE REVIEW AND LETTERS, 1996, 3 (03) : 1487 - 1494
  • [33] Structural and electronic properties of As:Gen on Si(001) surface
    Che, J.
    Zhang, K.
    Xie, X.
    Journal of Electron Spectroscopy and Related Phenomena, 1996, 80
  • [34] Structural and electronic properties of As:Gen on Si(001) surface
    Department of Physics, Fudan University, Shanghai 200433, China
    J Electron Spectrosc Relat Phenom, (169-172):
  • [35] Thermal adatoms an Si(001)
    Tromp, RM
    Mankos, M
    PHYSICAL REVIEW LETTERS, 1998, 81 (05) : 1050 - 1053
  • [36] Single-Hydrogen Dissociation Paths for Upright and Flat Acetophenone Adsorbates on the Si(001) Surface
    Mehdipour, Hamid
    JOURNAL OF PHYSICAL CHEMISTRY C, 2014, 118 (41): : 23682 - 23689
  • [37] Adsorption and diffusion of Si atoms on the H-terminated Si(001) surface: Si migration assisted by H mobility
    Nara, J
    Sasaki, T
    Ohno, T
    PHYSICAL REVIEW LETTERS, 1997, 79 (22) : 4421 - 4424
  • [38] Effects of surface oxide on the rapid thermal nitridation of Si(001)
    Copel, M
    Tromp, RM
    Timme, HJ
    Penner, K
    Nakao, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1996, 14 (02): : 462 - 464
  • [39] Adsorption and diffusion of Si on the Si(001): An empirical potential calculation
    Cai, J
    Wang, JS
    INTERNATIONAL JOURNAL OF MODERN PHYSICS B, 2002, 16 (04): : 621 - 629
  • [40] Bi on the Si(001) surface
    Kirkham, C. J.
    Brazdova, V.
    Bowler, D. R.
    PHYSICAL REVIEW B, 2012, 86 (03):