Room temperature deposition of magnetite thin films on organic substrate

被引:10
|
作者
Arisi, E. [1 ]
Bergenti, I. [1 ]
Cavallini, M. [1 ]
Murgia, M. [1 ]
Riminucci, A. [1 ]
Ruani, G. [1 ]
Dediu, V. [1 ]
机构
[1] Ist Studio Mat Nanostrutturati Bologna, I-40129 Bologna, Italy
关键词
organic semiconductor; thin film; magnetite; pulsed electron deposition; magnetic oxide;
D O I
10.1016/j.jmmm.2007.03.056
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on the growth of magnetite films directly on thin layers of organic semiconductors by means of an electron beam ablation method. The deposition was performed at room temperature in a reactive plasma atmosphere. Thin films show ferromagnetic (FM) hysteresis loops and coercive fields of hundreds of Oersted. Micro Raman analysis indicates no presence of spurious phases. The morphology of the magnetite film is strongly influenced by the morphology of the underlayer of the organic semiconductor. These results open the way for the application of magnetite thin films in the field of organic spintronics. (c) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:410 / 412
页数:3
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