Fabrication of nanometer scale gaps for thermo-tunneling devices

被引：7

作者：

Tanielian, M. H. ^{[1
]}

Greegor, R. B. ^{[1
]}

Nielsen, J. A. ^{[1
]}

Parazzoli, C. G. ^{[1
]}

机构：

[1] Boeing Res & Technol, Seattle, WA 98124 USA

来源：

APPLIED PHYSICS LETTERS | 2011年 / 99卷 / 12期

关键词：

METALLIC ELECTRODES; SEPARATION; EMISSION; NANOGAPS; CATHODE;

D O I：

10.1063/1.3641897

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report a fabrication approach for making nanometer wide gaps between two planar metallic electrodes, which can be utilized for the formation of thermo-tunneling devices. The technique is a three dimensional variant of the electromigration techniques used for creating nanometer sized gaps on planar surfaces. The gap is formed by applying a low level voltage between two parallel electrodes, each deposited on separate wafers that have been bonded together. I-V and thermal characterization of the gap show very good agreement with modeling results, indicating a tunneling gap on the order of 0.5-1 nm. (C) 2011 American Institute of Physics. [doi:10.1063/1.3641897]

引用

页数：3

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